4.7 Article

Lithium Niobate Ridge Waveguides Fabricated by Ion Implantation Followed by Ion Beam Etching

期刊

JOURNAL OF LIGHTWAVE TECHNOLOGY
卷 28, 期 13, 页码 1913-1916

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JLT.2010.2050296

关键词

Ion radiation effects; optical device fabrication; optical materials; waveguides components

资金

  1. National Natural Science Foundation of China [10975094, 10735070]
  2. National Basic Research Program of China [2010CB832906]
  3. New Century Excellent Talents of China
  4. Foundation for the Author of National Excellent Doctoral Dissertation of China

向作者/读者索取更多资源

A new fabrication method for lithium niobate ridge waveguides is reported. Lithium niobate ridge waveguide with a smooth surface was fabricated by O+ ions implanted combined with Ar ion beam etching. The beam propagation method (BPM) was used to simulate the properties of planar and ridge waveguides by use of a reconstructed refractive index profile. The simulation results match to the experimental results very well, and the loss value of the ridge waveguide is about 2 dB/cm.

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