期刊
OPTICS LETTERS
卷 40, 期 16, 页码 3778-3781出版社
OPTICAL SOC AMER
DOI: 10.1364/OL.40.003778
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资金
- ASML
- Carl Zeiss SMT AG
- Demcon
- Foundation for Fundamental Research on Matter (FOM)
- Industrial Focus Group XUV Optics
- PANalytical
- Province of Overijssel
- SolMates
- TNO
- University of Twente
We report a hybrid thin-film deposition procedure to significantly enhance the reflectivity of La/B-based multilayer structures. This is of relevance for applications of multilayer optics at 6.7-nm wavelength and beyond. Such multilayers showed a reflectance of 64.1% at 6.65 nm measured at 1.5-degrees off-normal incidence at PTB (BESSY-II). This was achieved by a special scheme of La passivation. The La layer was nitridated to avoid formation of the optically unfavorable LaBx compound at the B-on-La interface. To avoid the also undesired BN formation at the La-on-B interface, a time-dosed nitridation at the initial stage was applied. This research revealed a good potential for further increase in the reflectivity of multilayer structures at 6.7 nm. (C) 2015 Optical Society of America
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