期刊
JOURNAL OF ELECTRON MICROSCOPY
卷 57, 期 3, 页码 83-89出版社
OXFORD UNIV PRESS
DOI: 10.1093/jmicro/dfn008
关键词
HRTEM; in situ TEM; electron irradiation; Au nanoparticles
类别
In this study, we describe the transport of gold (Au) nanoparticles from the surface into crystalline silicon (Si) covered by silicon oxide (SiO2) as revealed by in situ high-resolution transmission electron microscopy. Complete crystalline Au nanoparticles sink through the SiO2 layer into the Si substrate when high-dose electron irradiation is applied and temperature is raised above 150 degrees C. Above temperatures of 250 degrees C, the Au nanoparticles finally dissolve into fragments accompanied by crystallization of the amorphized Si substrate around these fragments. The transport process is explained by a wetting process followed by Stokes motion. Modelling this process yields boundaries for the interface energies involved.
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