期刊
JOURNAL OF CRYSTAL GROWTH
卷 338, 期 1, 页码 16-19出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2011.10.009
关键词
Defects; Semiconductor silicon compounds
资金
- ONR [N00014-05-C-0324]
A new type of extended defect was identified in 4H-SiC homoepitaxial epilayers. The defect has a characteristic trapezoidal shape with parallel sides perpendicular to the off-cut direction in ultraviolet photoluminescence intensity maps. Structural characterization of the defect using a transmission electron microscope revealed that the trapezoid defect consisted of multiple Frank type stacking faults. The faults originate in the substrate and propagate into the epilayer during epitaxy. (C) 2011 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据