4.4 Article

Trapezoid defect in 4H-SiC epilayers

期刊

JOURNAL OF CRYSTAL GROWTH
卷 338, 期 1, 页码 16-19

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ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2011.10.009

关键词

Defects; Semiconductor silicon compounds

资金

  1. ONR [N00014-05-C-0324]

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A new type of extended defect was identified in 4H-SiC homoepitaxial epilayers. The defect has a characteristic trapezoidal shape with parallel sides perpendicular to the off-cut direction in ultraviolet photoluminescence intensity maps. Structural characterization of the defect using a transmission electron microscope revealed that the trapezoid defect consisted of multiple Frank type stacking faults. The faults originate in the substrate and propagate into the epilayer during epitaxy. (C) 2011 Elsevier B.V. All rights reserved.

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