Development of a multiscale model for an atomic layer deposition process

A multiscale model of atomic layer deposition (ALD) inside a nanoporous material is developed in this paper. The overall model couples a lattice Monte Carlo simulator describing molecular-scale growth of the ALD film to a continuum description of the precursor transport within the nanopore. The multiscale simulation approach is used to study how intra-pore precursor depletion leads to nonuniform ALD films and to examine whether film properties, such as composition and surface roughness, are functions of position within the pore. (C) 2010 Elsevier BM. All rights reserved.