4.4 Article

Microstructure of epitaxial rutile TiO2 films grown by molecular beam epitaxy on r-plane Al2O3

期刊

JOURNAL OF CRYSTAL GROWTH
卷 312, 期 1, 页码 149-153

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2009.10.005

关键词

Molecular beam epitaxy; Oxides; Titanium compounds; Dielectric materials

资金

  1. National Science Foundation through the UCSB MRL [DMR05-20415]
  2. Alexander-von-Humboldt foundation

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The paper reports on the microstructure of rutile TiO2 films grown on r-plane sapphire surfaces by molecular beam epitaxy as a function of oxygen flux during growth. Single-phase, epitaxial rutile films were obtained for all growth conditions. X-ray diffraction and transmission electron microscopy showed that the films contained a high density of twins, likely as a result of different variants nucleating on the substrate simultaneously. At low oxygen fluxes, surface features were dominated by twin variants. With increasing oxygen flux, the surface morphology changed due to the reduced mobility of ad-atoms. The relationship between the arrangements of oxygen octahedra in the sapphire and rutile structures, the epitaxial orientation and twin formation is discussed. (C) 2009 Elsevier B.V. All rights reserved.

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