期刊
JOURNAL OF CRYSTAL GROWTH
卷 311, 期 15, 页码 3918-3923出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2009.06.001
关键词
Surface structure; Physical vapor deposition processes; Zinc compounds; Semiconducting II-VI materials
资金
- NSF [20873177, 10574153]
- MOST of China [2007CB936800]
Thin FeO(111) buffer layers prepared on Mo(110) substrate were used to grow ordered ZnO films under ultrahigh vacuum condition, and were in situ characterized by various surface analytical techniques. A chemical interaction between Zn (or ZnO) and FeO(111) can effectively lower the interfacial energy, which is in favor of an epitaxial growth of ZnO on FeO layers. Compared with the MgO(111) buffer layer used for the growth of ZnO(0001) on sapphire (0001) surface, the FeO(111) thin films might be a better one because it is more thermally stable. Our experimental results provide constructive information on the growth mechanism of ZnO-based materials, which is helpful for further understanding the growth mechanism of related oxide materials. (c) 2009 Elsevier B.V. All rights reserved.
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