期刊
JOURNAL OF CRYSTAL GROWTH
卷 310, 期 18, 页码 4054-4057出版社
ELSEVIER
DOI: 10.1016/j.jcrysgro.2008.06.075
关键词
crystal structure; X-ray diffraction; metal-organic chemical vapor deposition; oxides
资金
- National Natural Science Foundation of China [50672054]
Single-crystalline In2O3 thin films were obtained on alpha-Al2O3 (0 0 0 1) substrates by the metalorganic chemical vapor deposition (MOCVD) method. The structural, optical and photoluminescence (PL) properties of the In2O3 films were investigated in detail. The sample prepared at 650 degrees C exhibited best crystal quality with body-centered cubic (bcc) structure of pure In2O3. The average transmittance for the films in the visible spectral range exceeded 85%. A single and sharp ultra-violet PL peak near 337 nm was observed at room temperature (RT). The corresponding PL mechanisms were investigated. (C) 2008 Elsevier B.V. All rights reserved.
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