Syntheses, structures, and thermal properties of new Au(III) organometallic compounds with ancillary S-, O-, and/or N-donor ligands

((CH3)(2)Au)(2)C2O4 (1), ((CH3)(2)AuSCN)(2) (2), (CH3)(2)AuSSP(OCH3)(2) (3), and (CH3)(2)AuSSP(OC2H5)(2) (4) were prepared and recrystallized from hexane to determine their crystal structures and analyze them by thermal methods (TGA). The compounds have been investigated as new possible precursors for metal-organic chemical vapor deposition (MOCVD). Compounds 1 and 2 are solids, while 3 and 4 are liquids. Crystal structures of 1 and 2 have been studied by single-crystal X-ray diffraction (XRD): compounds are monoclinic, space group for 1 P2(1)/c, for 2 P2(1)/n. Compound 1 has crystal parameters a = 7.6952(5) angstrom, b = 11.1814(8) angstrom, c = 12.2893(8) angstrom, alpha = 90 degrees, beta = 104.922(4)degrees, gamma = 90 degrees; 2 has crystal parameters a = 5.6184(3) angstrom, b = 15.2744(6) angstrom, c = 6.9202(3) angstrom, alpha = 90 degrees, beta = 102.864(2)degrees, gamma = 90 degrees. These are neutral complexes, in which molecules are only connected by van der Waal's interactions. Thermal gravimetric analyses (TGA) have shown that 3 and 4 evaporate practically without decomposition. MOCVD experiments were carried out at lower pressure using 3 and 4 as precursors. The films were grown on Si substrate and investigated by XRD and SEM.