期刊
JOURNAL OF APPLIED POLYMER SCIENCE
卷 131, 期 18, 页码 -出版社
WILEY
DOI: 10.1002/app.40798
关键词
biodegradable; copolymers; microscopy; nanostructured polymers; self-assembly
资金
- Science Foundation Ireland (SFI) [09/IN.1/602]
- CSET/CRANN
- LAMAND NMP FP7 grant
Self-assembled thin films of a lamellar forming polystyrene-block-poly(D,L)lactide (PS-b-PLA) block copolymer (BCP) contain a reactive block that can be readily removed to provide a template for substrate pattern formation. Various methods of PLA removal were studied here with a view to develop the system as an on-chip etch mask for substrate patterning. Solvo-microwave annealing was used to induce microphase separation in PS-b-PLA BCP with a periodicity of 34 nm (L-o) on silicon and silicon on insulator (SOI) substrates. Wet etches based on alkaline and enzymatic solutions were studied in depth. Fourier transform-infrared (FT-IR) analysis showed that basic hydrolysis using sodium hydroxide (NaOH) or ammonium hydroxide (NH4OH) solutions resulted in greater PLA removal in comparison to an enzymatic approach using Proteinase K in a Tris-HCl buffer solution. However, in the enzymatic approach, the characteristic self-assembled fingerprint patterns were retained with less damage. Comparison to a dry etch procedure using a reactive ion etch (RIE) technique was made. A detailed study of the etch rate of PS and PLA homopolymer and PS-b-PLA shows depending on DC bias, the etch selectivity of PLA and PS (dPLA/dPS) can be almost doubled from 1.7 at DC bias 145 V to 3 at DC bias 270 V. (C) 2014 Wiley Periodicals, Inc.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据