期刊
JOURNAL OF APPLIED PHYSICS
卷 111, 期 9, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.4710993
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资金
- MARCO Materials Structures and Devices (MSD) Focus Center
The question of what fraction of the total heat flow is transported by phonons with different mean-free-paths is addressed using a Landauer approach with a full dispersion description of phonons to evaluate the thermal conductivities of bulk and thin film silicon. For bulk Si, the results reproduce those of a recent molecular dynamic treatment showing that about 50% of the heat conduction is carried by phonons with a mean-free-path greater than about 1 mu m. For the in-plane thermal conductivity of thin Si films, we find that about 50% of the heat is carried by phonons with mean-free-paths shorter than in the bulk. When the film thickness is smaller than similar to 0.2 mu m, 50% of the heat is carried by phonons with mean-free-paths longer than the film thickness. The cross-plane thermal conductivity of thin-films, where quasi-ballistic phonon transport becomes important, is also examined. For ballistic transport, the results reduce to the well-known Casimir limit [H. B. G. Casimir, Physica 5, 495-500 (1938)]. These results shed light on phonon transport in bulk and thin-film silicon and demonstrate that the Landauer approach provides a relatively simple but accurate technique to treat phonon transport from the ballistic to diffusive regimes. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4710993]
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