4.6 Article

Adhesion layer-bottom electrode interaction during BaxSr1-xTiO3 growth as a limiting factor for device performance

期刊

JOURNAL OF APPLIED PHYSICS
卷 111, 期 12, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.4730781

关键词

-

资金

  1. Swedish Research Council [2009-3460]
  2. Knut and Alice Wallenberg Foundation

向作者/读者索取更多资源

Changes in bottom electrode morphology and adhesion layer composition upon deposition of BaxSr1-xTiO3 (BSTO) at elevated temperatures have been found, which have a negative impact on acoustic wave resonator device performance. The difference between nominal and actual adhesion layer composition are explained by grain boundary diffusion of Ti or W and their oxidation by in-diffusing oxygen, which leads to an increased interface roughness between the Pt bottom electrode and the BSTO. It is shown, that room-temperature deposited TiO2 diffusion barriers fail to protect against Ti oxidation and diffusion. Also W adhesion layers are prone to this phenomenon, which limits their ability to act as high temperature resistant adhesion layers for bottom electrodes for ferroelectric thin films. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4730781]

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据