4.6 Article

Photonic crystals with defect structures fabricated through a combination of holographic lithography and two-photon lithography

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JOURNAL OF APPLIED PHYSICS
卷 108, 期 7, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.3493119

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  1. U.S. National Science Foundation [DMI-0609345, CMMI-0900458, CMMI-0900564]
  2. U.S. Air Force [FA9550-06-1-0518]
  3. Div Of Civil, Mechanical, & Manufact Inn
  4. Directorate For Engineering [0900564, GRANTS:13685440, 1115903, GRANTS:13998103] Funding Source: National Science Foundation
  5. Div Of Civil, Mechanical, & Manufact Inn
  6. Directorate For Engineering [1109971] Funding Source: National Science Foundation

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This paper presents the capability of direct laser writing of complex defect structures in holographically formed three-dimensional photonic crystals in dipentaerythritol penta/hexaacrylate (DPHPA) monomers mixed with photoinitiators. The three-dimensional photonic crystal template was fabricated through prism-based holographic lithography. Defect structures are fabricated through the two-photon polymerization excited by a femtosecond laser. The strengths of two optical lithographic techniques are combined with holographic lithography providing a rapid and large area microfabrication and two-photon lithography providing flexibility in fabrication of defect structures. The optical fabrication process is simplified in the negative tone DPHPA without prebake and postexposure bake as is required of SU-8 while maintaining a capability for constructing photonic structures with small features. (C) 2010 American Institute of Physics. [doi:10.1063/1.3493119]

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