4.6 Article

Forming-free colossal resistive switching effect in rare-earth-oxide Gd2O3 films for memristor applications

期刊

JOURNAL OF APPLIED PHYSICS
卷 106, 期 7, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.3236573

关键词

-

资金

  1. Ministry of Science and Technology of China [2006AA03Z308]
  2. Natural Science Foundation of Shanghai [08ZR1421500]
  3. Shanghai Basic Research Program [08JC1420600]
  4. Shanghai-AM Research and Development Fund [08700740900]

向作者/读者索取更多资源

The reproducible forming-free resistive switching (RS) behavior in rare-earth-oxide Gd2O3 polycrystalline thin film was demonstrated. The characteristic of this forming-free RS was similar to that of other forming-necessary binary RS materials except that its initial resistance starts from not the high resistance state (HRS) but the low resistance state (LRS). An ultrahigh resistance switching ratio from HRS to LRS of about six to seven orders of magnitude was achieved at a bias voltage of 0.6 V. Mechanism analysis indicated that the existence of metallic Gd in the Gd2O3 films plays an important role in the forming-free RS performance. Our work provides a novel material with interesting RS behavior, which is beneficial to deepen our understanding of the origin of RS phenomenon. (c) 2009 American Institute of Physics. [doi:10.1063/1.3236573]

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据