相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。Electrical conduction control of carbon nanowalls
Wakana Takeuchi et al.
APPLIED PHYSICS LETTERS (2008)
Fabrication of carbon nanowalls using electron beam excited plasma-enhanced chemical vapor deposition
Takateru Mori et al.
DIAMOND AND RELATED MATERIALS (2008)
Highly reliable growth process of carbon nanowalls using radical injection plasma-enhanced chemical vapor deposition
Shingo Kondo et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2008)
Ultrafine patterning of nanocrystalline diamond films grown by microwave plasma-assisted chemical vapor deposition
Hidenori Gamo et al.
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS (2007)
Insights into sticking of radicals on surfaces for smart plasma nano-processing
Masaru Hori et al.
APPLIED SURFACE SCIENCE (2007)
Fabrication of carbon nanowalls using novel plasma processing
Mineo Hiramatsu et al.
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS (2006)
Low-k SiOCH film deposited by plasma-enhanced chemical vapor deposition using hexamethyldisiloxane and water vapor
Y Shioya et al.
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS (2005)
The effect of the CH4 plasma treatment on deposited SiOC(-H) films with low dielectric constant prepared by using TMS/O2 PECVD
CS Yang et al.
THIN SOLID FILMS (2005)
Free-standing subnanometer graphite sheets
JJ Wang et al.
APPLIED PHYSICS LETTERS (2004)
Fabrication of vertically aligned carbon nanowalls using capacitively coupled plasma-enhanced chemical vapor deposition assisted by hydrogen radical injection
M Hiramatsu et al.
APPLIED PHYSICS LETTERS (2004)
Electric field effect in atomically thin carbon films
KS Novoselov et al.
SCIENCE (2004)
Role of carbon atoms in the remote plasma deposition of hydrogenated amorphous carbon
J Benedikt et al.
JOURNAL OF APPLIED PHYSICS (2003)
Measurement of oxygen atom density employing vacuum ultraviolet absorption spectroscopy with microdischarge hollow cathode lamp
H Nagai et al.
REVIEW OF SCIENTIFIC INSTRUMENTS (2003)
Measurements of atomic carbon density in processing plasmas by vacuum ultraviolet laser absorption spectroscopy
N Tanaka et al.
JOURNAL OF APPLIED PHYSICS (2002)
Measurement techniques of radicals, their gas phase and surface reactions in reactive plasma processing
M Hori et al.
APPLIED SURFACE SCIENCE (2002)
Behavior of atomic radicals and their effects on organic low dielectric constant film etching in high density N-2/H-2 and N-2/NH3 plasmas
H Nagai et al.
JOURNAL OF APPLIED PHYSICS (2002)
Behavior of hydrogen atoms in ultrahigh-frequency silane plasma
S Takashima et al.
JOURNAL OF APPLIED PHYSICS (2001)
Development of vacuum ultraviolet absorption spectroscopy technique employing nitrogen molecule microdischarge hollow cathode lamp for absolute density measurements of nitrogen atoms in process plasmas
S Takashima et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS (2001)