4.6 Article

Raman studies of GaN/sapphire thin film heterostructures

期刊

JOURNAL OF APPLIED PHYSICS
卷 106, 期 5, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.3213370

关键词

gallium compounds; III-V semiconductors; MOCVD; nucleation; phonons; Raman spectra; sapphire; semiconductor thin films; tensile strength

资金

  1. U. S. National Science Foundation [EAR 05- 38884]
  2. Directorate For Engineering
  3. Div Of Electrical, Commun & Cyber Sys [921517] Funding Source: National Science Foundation

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Using Raman spectroscopy, we have studied the optical phonon modes of GaN nucleation layers with the thicknesses of 7 and 45 nm, grown on sapphire (0001) substrates by metal organic chemical vapor deposition at low temperatures (500-600 degrees C). These layers consisted of mixed hexagonal and cubic phases. The Raman results from mixed phases were compared with those from pure hexagonal layers which were grown at higher temperatures over 1000 degrees C. The E-2(Pi) and A(1)(LO) phonon modes are observed at 548 and 733 cm(-1) for 45 nm thick nucleation layer, while the silent low-frequency B-1 mode which is forbidden in good quality hexagonal GaN is observed at 314 cm(-1). The presence of the strong hexagonal modes for GaN nucleation layers of 45 nm thick confirms the crystalline nature of the GaN nucleation layer and dominant hexagonal phase in this mixed cubic-hexagonal nucleation layer. The observed frequencies are shifted with respect to the corresponding A(1) and E-2 phonon modes in hexagonal GaN. The decrease in mode frequency implies the presence of in-plane tensile strain in these GaN nucleation layers of 45 nm thick. The Raman scattering spectra taken from different positions on the sample show similar spectral features, indicating that the GaN nucleation layers of 45 nm thick are homogeneous in micron scale.

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