期刊
JOURNAL OF APPLIED PHYSICS
卷 106, 期 5, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3149777
关键词
Faraday effect; ion beam effects; ion sources; molybdenum; ruthenium; silicon; sputtering; X-ray reflection
资金
- Nederlandse Organisatie voor Wetenschappelijk Onderzoek (NWO)
Ion sputtering yields for Ru, Mo, and Si under Ar+ ion bombardment in the near-threshold energy range have been studied using an in situ weight-loss method with a Kaufman ion source, Faraday cup, and quartz crystal microbalance. The results are compared to theoretical models. The accuracy of the in situ weight-loss method was verified by thickness-decrease measurements using grazing incidence x-ray reflectometry, and results from both methods are in good agreement. These results provide accurate data sets for theoretical modeling in the near-threshold sputter regime and are of relevance for (optical) surfaces exposed to plasmas, as, for instance, in extreme ultraviolet photolithography.
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