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注意：仅列出部分参考文献，下载原文获取全部文献信息。Silicon surface passivation by atomic layer deposited Al2O3
B. Hoex et al.
JOURNAL OF APPLIED PHYSICS (2008)
Excellent passivation of highly doped p-type Si surfaces by the negative-charge-dielectric Al2O3
B. Hoex et al.
APPLIED PHYSICS LETTERS (2007)
Enhancement in the efficiency of light emission from silicon by a thin Al2O3 surface-passivating layer grown by atomic layer deposition at low temperature
M. J. Chen et al.
JOURNAL OF APPLIED PHYSICS (2007)
Plasma and thermal ALD of Al2O3 in a commercial 200 mm ALD reactor
J. L. van Hemmen et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2007)
Very low surface recombination velocities on p-type silicon wafers passivated with a dielectric with fixed negative charge
G. Agostinelli et al.
SOLAR ENERGY MATERIALS AND SOLAR CELLS (2006)
Spectroscopic second-harmonic generation during Ar+-ion bombardment of Si(100)
J. J. H. Gielis et al.
PHYSICAL REVIEW B (2006)
Polarity of space charge fields in second-harmonic generation spectra of Si(100)/SiO2 interfaces
A. Rumpel et al.
PHYSICAL REVIEW B (2006)
Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
B. Hoex et al.
APPLIED PHYSICS LETTERS (2006)
Optical characterization of process-dependent charging in hafnium oxide structures
R. Carriles et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2006)
Second-harmonic generation from Si/SiO2/Hf(1-x)SixO2 structures
R Carriles et al.
APPLIED PHYSICS LETTERS (2006)
Surface passivation of III-V compound semiconductors using atomic-layer-deposition-grown Al2O3 -: art. no. 252104
ML Huang et al.
APPLIED PHYSICS LETTERS (2005)
Optical second harmonic generation studies of ultrathin high-k dielectric stacks -: art. no. 083711
V Fomenko et al.
JOURNAL OF APPLIED PHYSICS (2005)
Interfaces and defects of high-K oxides on silicon
J Robertson
SOLID-STATE ELECTRONICS (2005)
Band offsets measured by internal photoemission-induced second-harmonic generation
Z Marka et al.
PHYSICAL REVIEW B (2003)
Characterization of charge-carrier dynamics in thin oxide layers on silicon by second harmonic generation
YD Glinka et al.
PHYSICAL REVIEW B (2002)
Electron energy barriers between (100)Si and ultrathin stacks of SiO2, Al2O3, and ZrO2 insulators
VV Afanas'ev et al.
APPLIED PHYSICS LETTERS (2001)
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