High diffraction efficiency at hard X-ray energy in a silicon crystal bent by indentation

The diffraction properties of a crystalline silicon plate of which one face was mechanically indented have been studied. This treatment induced a permanent curvature in the sample, which allowed a diffraction efficiency of 88% for 150 keV photons, i.e. a reflectivity of 64% including the absorption. This efficiency is constant over 14 arcseconds and is very close to the theoretical expectation, meaning that the curvature is highly homogeneous. The technique enables the fabrication, in a very reproducible fashion, of crystals for the realization of an astronomical hard X-ray concentrator (Laue lens).