4.5 Article

Negative (and very low) thermal expansion in ReO3 from 5 to 300 K

期刊

JOURNAL OF APPLIED CRYSTALLOGRAPHY
卷 42, 期 -, 页码 253-258

出版社

WILEY-BLACKWELL
DOI: 10.1107/S002188980804332X

关键词

-

向作者/读者索取更多资源

This paper reports the accurate measurement of the ReO3 cell parameter as a function of temperature. The thermal expansion is confirmed to be negative over most of the temperature range from 5 to 300 K. The main problems with the measurements are the very small variations (in the range of 10(-5) angstrom) in the cell parameter at each temperature, requiring tight control of the stability and reliability of instrumental effects. In particular, achieving monochromator stability over time might be challenging with the high energy and high beam current variations of a third-generation synchrotron facility. On the other hand, such effects are usually checked by the addition of silicon as an internal standard, but the accuracy (and precision) of the published thermal expansion (which is not certified) might not be sufficient for its use when dealing with very small cell parameter variations.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.5
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据