期刊
JOURNAL OF ALLOYS AND COMPOUNDS
卷 611, 期 -, 页码 446-451出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2014.05.023
关键词
Aluminium; Photoluminance; Spray pyrolysis; Phthalic acid; Zinc oxide
资金
- University Grants Commission, New Delhi, India [39-466/2010(SR)]
Undoped and Al doped ZnO (AZO) thin films are successfully prepared by spray pyrolysis technique at optimised substrate temperature of 400 degrees C onto amorphous and F:SnO2 coated glass substrates. Effect of Al doping on structural, morphological and optical properties of ZnO thin films is studied. Deposited films are polycrystalline with a hexagonal (wurtzite) crystal structure having (002) preferred orientation. The PEC characterization shows that, short circuit current (I-sc) and open circuit voltage (V-oc) are (I-sc = 0.38 mA and V-oc = 421 mV) relatively higher at the 3 at.% Al doping. SEM images show deposited thin films are compact and uniform with seed like grains. All films exhibit average transmittance of about 82% in the visible region and a sharp absorption onset at 375 nm corresponding to 3.3 eV. The photocatalytic activities of the large surface area (64 cm(2)) Al-doped ZnO photocatalyst samples were evaluated by photoelectrocatalytic degradation of phthalic acid under UV light irradiation. The results show that the 3 at.% AZO thin film photocatalyst exhibited degradation of phthalic acid up to about 45% within 3 h with significant reduction in COD and TOC values. (C) 2014 Elsevier B.V. All rights reserved.
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