期刊
JOURNAL OF ALLOYS AND COMPOUNDS
卷 470, 期 1-2, 页码 408-412出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2008.02.081
关键词
Zinc oxide; Nanostructured materials; Thin films; Sol-gel processes; optical properties
Undoped and Al doped ZnO thin films were prepared on glass substrate by sol-gel dip coating from PVP-modified zinc acetate dihydrate and aluminium chloride hexahydrate solutions. The XRD patterns of all thin films indexed a highly preferential orientation along c-axis. The AFM images showed the average grain size of undoped ZnO thin film was about 101 nm whereas the smallest average grain size at 8 mol% At was about 49 nm. The values of direct optical band gap of thin films varied in the range of 3.70-3.87 eV. (C) 2008 Elsevier B.V. All rights reserved.
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