4.7 Article

Thermoelectric properties of Al-doped Mg2Si1-xSnx (x ≤ 0.1)

期刊

JOURNAL OF ALLOYS AND COMPOUNDS
卷 466, 期 1-2, 页码 335-340

出版社

ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2007.11.029

关键词

lntermetallics; Thermoelectric materials; Electrical transport; Impurities in semiconductors

资金

  1. Ministry of Education, Culture, Sports, Science and Technology [18760514]
  2. Grants-in-Aid for Scientific Research [18760514] Funding Source: KAKEN

向作者/读者索取更多资源

The thermoelectric properties of Al-doped Mg2Si1-xSnx(x = 0.0-0.1) [Mg2Si1-xSnxAl = 1:y (0.00 <= y <= 0.02)] fabricated by spark plasma sintering have been characterized by Hall effect measurements at 300 K and by measurements of electrical resistivity (rho), the Seebeck coefficient (S). and thermal conductivity (kappa) between 300 and 900K. Al-doped Mg2Si1-xSnx samples are n-type in the measured temperature range. By Al-doping, electron concentration is controlled up to 5.3 x 10(19) cm(-3) in the composition range 0.0 <= x <= 0.1. Al-doped Mg2Si0.9Sn0.1 shows a maximum value of the figure of merit ZT of 0.68 at 864 K, which is 6 times larger than that of nondopcd Mg2Si0.9Sn0.1. (C) 2007 Elsevier B.V. All rights reserved.

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