4.8 Article

Ripplocations in van der Waals Layers

期刊

NANO LETTERS
卷 15, 期 2, 页码 1302-1308

出版社

AMER CHEMICAL SOC
DOI: 10.1021/nl5045082

关键词

2D layered crystals; van der Waals homostructures; MoS2; ripple; dislocation

资金

  1. NSF [CBET-1240696, DMR-1120901, DMR-1240933, CMMI-0900692]
  2. Extreme Science and Engineering Discovery Environment (XSEDE) [TG-DMR130038, TG-DMR140003]
  3. Laboratory Directed Research and Development (LDRD) project at Sandia National Laboratories
  4. Nanostructures for Electrical Energy Storage (NEES), an Energy Frontier Research Center - US Department of Energy (DOE), Office of Science, Office of Basic Energy Sciences (BES) [DESC0001160]

向作者/读者索取更多资源

Dislocations are topological line defects in three-dimensional crystals. Same-sign dislocations repel according to Franks rule vertical barb(1) + b(2)vertical bar(2) > vertical barb(1)vertical bar(2) + vertical barb(2)vertical bar(2). This rule is broken for dislocations in van der Waals (vdW) layers, which possess crystallographic Burgers vector as ordinary dislocations but feature surface ripples due to the ease of bending and weak vdW adhesion of the atomic layers. We term these line defects ripplocations in accordance to their dual surface ripple and crystallographic dislocation characters. Unlike conventional ripples on noncrystalline (vacuum, amorphous, or fluid) substrates, ripplocations tend to be very straight, narrow, and crystallographically oriented. The self-energy of surface ripplocations scales sublinearly with |b|, indicating that same-sign ripplocations attract and tend to merge, opposite to conventional dislocations. Using in situ transmission electron microscopy, we directly observed ripplocation generation and motion when few-layer MoS2 films were lithiated or mechanically processed. Being a new subclass of elementary defects, ripplocations are expected to be important in the processing and defect engineering of vdW layers.

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