期刊
JAPANESE JOURNAL OF APPLIED PHYSICS
卷 53, 期 4, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.7567/JJAP.53.04EF03
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A channel length of a c-axis aligned crystal indium gallium zinc oxide (CAAC-IGZO) transistor having low off-state current at a yA/mu m level was decreased to 100 nm, and the electrical characteristics and short-channel effect of the CAAC-IGZO transistor were researched. As a result, we found that, in the CAAC-IGZO transistor with L = 100 nm, even with a gate insulator film having an equivalent oxide thickness (EOT) = 11 nm, an extremely small off-state current of 380 yA/mu m at 85 C is maintained, in addition channel length dependence of the electrical characteristics is hardly seen. Favorable values of characteristics of the CAAC-IGZO transistor can be obtained, such as subthreshold slope (SS) = 77 mV/dec, drain induced barrier lowering (DIBL) = 73mV/V, threshold voltage (V-th) = 0.65V, and on-state current (I-on) = 65 mu A/mu m. These results suggest the possibility that the CAAC-IGZO transistor can be applied to an LSI in a deep submicron region. (C) 2014 The Japan Society of Applied Physics
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