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Ultrascaled InAlN/GaN High Electron Mobility Transistors with Cutoff Frequency of 400GHz

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IOP PUBLISHING LTD
DOI: 10.7567/JJAP.52.08JN14

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  1. Defense Advanced Research Projects Agency [HR0011-10-C-0015]
  2. Air Force Office of Scientific Research

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We report on 30-nm-gate-length InAlN/AlN/GaN/SiC high-electron-mobility transistors (HEMTs) with a record current gain cutoff frequency (f(T)) of 400 GHz. Although the high drain-induced barrier lowering (DIBL) value is indicative of significant short-channel effects, more than seven orders of magnitude in the current on/off ratio was observed. The high f(T) is a result of minimized parasitic effects and at the expense of a low power gain cutoff frequency (f(MAX)). The gate length dependence and temperature dependence of f(T) were also measured. (C) 2013 The Japan Society of Applied Physics

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