期刊
JAPANESE JOURNAL OF APPLIED PHYSICS
卷 50, 期 3, 页码 -出版社
JAPAN SOC APPLIED PHYSICS
DOI: 10.1143/JJAP.50.036001
关键词
-
The effects of nonuniform bulk plasma density and charging at dielectric surfaces have been incorporated into our multidimensional, semianalytical rf sheath model for single- and dual-frequency capacitively coupled plasmas based on the finite element method. The present modification allows us more accurate prediction of spatiotemporal distributions of potential and electric field in the sheath, and hence of electron and ion densities. The spatial distributions of the electric field and the potential above a junction of two different metals and those above a metal-dielectric interface obtained using the modified rf sheath model agree very well with measured data referred to in this study. This result proves the validity of our rf sheath model modified in this study. (C) 2011 The Japan Society of Applied Physics
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据