期刊
JAPANESE JOURNAL OF APPLIED PHYSICS
卷 49, 期 6, 页码 -出版社
JAPAN SOC APPLIED PHYSICS
DOI: 10.1143/JJAP.49.065201
关键词
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资金
- High-Tech Research Center [HRC707]
- Ministry of Education, Culture, Sports, Science and Technology, Japan (MEXT)
- Japan Society for the Promotion of Science (JSPS) [19760613]
- Grants-in-Aid for Scientific Research [19760613] Funding Source: KAKEN
Micro- and nano-scale fabrications of various fluorinated polymers were demonstrated by direct maskless etching using a focused ion beam (FIB). The etching rates of perfluorinated polymers, such as poly(tetrafluoroethylene) (PTFE), poly(tetrafluoroethylene-co-hexafluoropropylene) (FEP), poly(tetrafluoroethylene-co-perfluoroalkoxyvinylether) (PFA), were about 500-1000 times higher than those of partially fluorinated polymers, such as poly(tetrafluoroethylene-co-ethylene) (ETFE) and poly(vinilydene-fluoride) (PVdF). Controlled high quality and high aspect-ratio nanostructures of spin-coated cross-linked PTFE were obtained without solid debris. The height and diameter of the fibers were about 1.5 mu m and 90 nm, respectively. Their aspect ratio was about 17. (C) 2010 The Japan Society of Applied Physics
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