期刊
JAPANESE JOURNAL OF APPLIED PHYSICS
卷 47, 期 4, 页码 2701-2703出版社
IOP PUBLISHING LTD
DOI: 10.1143/JJAP.47.2701
关键词
resistive memory; TiO2; Gd doping
Binary nietal-oxide-based resistive memory devices generally show broad dispersions of resistive switching parameters with continuous resistive switching, and this leads to severe readout and control hazards. In this paper, we report improvements of the resistive switching characteristics in TiO2-based resistive memory devices induced by the Gd doping of TiO2 films. The effect of Gd doping on the resistive switching of TiO2-based resistive memory devices is discussed.
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