4.6 Article

Cracking mechanisms in lithiated silicon thin film electrodes

期刊

INTERNATIONAL JOURNAL OF SOLIDS AND STRUCTURES
卷 51, 期 23-24, 页码 4176-4187

出版社

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.ijsolstr.2014.08.008

关键词

Lithium ion battery; Lithiation-induced stress; Sequential cracking; Silicon islands; Finite element analysis

资金

  1. NSF [NSF-CMMI-1300805, NSF-CMMI-1300458]
  2. Directorate For Engineering
  3. Div Of Civil, Mechanical, & Manufact Inn [1300458, 1300805] Funding Source: National Science Foundation

向作者/读者索取更多资源

The massive cracking of silicon thin film electrodes in lithium ion batteries is associated with the colossal volume changes that occur during lithiation and delithiation cycles. However, the underlying cracking mechanism or even whether fracture initiates during lithiation or delithiation is still unknown. Here, we model the stress generation in amorphous silicon thin films during lithium insertion, fully accounting for the effects of finite strains, plastic flow, and pressure-gradients on the diffusion of lithium. Our finite element analyses demonstrate that the fracture of lithiated silicon films occurs by a sequential cracking mechanism which is distinct from fracture induced by residual tension in conventional thin films. During early-stage lithiation, the expansion of the lithium-silicon subsurface layer bends the film near the edges, and generates a high tensile stress zone at a critical distance away within the lithium-free silicon. Fracture initiates at this high tension zone and creates new film edges, which in turn bend and generate high tensile stresses a further critical distance away. Under repeated lithiation and delithiation cycles, this sequential cracking mechanism creates silicon islands of uniform diameter, which scales with the film thickness. The predicted island sizes, as well as the abrupt mitigation of fracture below a critical film thickness due to the diminishing tensile stress zone, is quantitatively in good agreement with experiments. (C) 2014 Elsevier Ltd. All rights reserved.

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