4.7 Article

Kinetics of NiO reduction by H2 and Ni oxidation at conditions relevant to chemical-looping combustion and reforming

期刊

INTERNATIONAL JOURNAL OF HYDROGEN ENERGY
卷 39, 期 16, 页码 8535-8556

出版社

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.ijhydene.2014.03.161

关键词

Chemical-looping; Nickel oxidation; Nickel reduction; Oxygen carrier; Solid-state kinetics

资金

  1. National Science Foundation [1054718]
  2. W.R. Grace Co.
  3. Directorate For Engineering
  4. Div Of Chem, Bioeng, Env, & Transp Sys [1054718] Funding Source: National Science Foundation

向作者/读者索取更多资源

Twenty solid-state kinetic models, including mechanisms dominated by reaction order, geometrical contraction, diffusion, nucleation, random pore growth, as well as the more flexible Sestak-Berggren and Prout-Tompkins models, are reviewed and applied to describe the reduction of unsupported and supported NiO by H-2 and the oxidation of supported Ni by air. In an effort to address the inconsistencies in the literature regarding the suitability of each mechanism to describe the kinetics of Ni-based oxygen carriers in chemical-looping, all the models are compared against experimental data from the literature and with in-house experiments at conditions relevant to chemical-looping combustion and reforming with Ni-based oxygen carriers. A statistical approach to compare models of varying fidelity is employed, involving the Akaike Information Criterion and the F-test. The effect of temperature on the selection of the best-suited model is investigated, supplemented by experimental evidence from X-ray diffraction and scanning electron microscopy analyses. This work reveals that unsupported and supported NiO reduction can be described by nucleation and nuclei growth models. The oxidation kinetics of supported Ni is well-predicted by geometrical contraction models. Calcination and high-temperature treatment during oxygen carrier synthesis are shown to significantly affect the reaction kinetics of the oxygen carrier. Copyright (C) 2014, Hydrogen Energy Publications, LLC. Published by Elsevier Ltd. All rights reserved.

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