期刊
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
卷 32, 期 -, 页码 125-130出版社
ELSEVIER SCI LTD
DOI: 10.1016/j.mssp.2014.12.061
关键词
Semiconductor; WEDM; Multi-discharge channels; Processing efficiency
类别
资金
- National Natural Science Foundation of China [50975142]
- Jiangsu Key Technology RD Program [BE2009161]
This paper studies the discharge characteristics of metal and semiconductor processing by WEDM, proves single-channel discharge in metal EDM and finds multi-channel discharge phenomenon in semiconductor EDM. The mechanism has been analyzed in this paper. The main reason for multi-channel discharge is the existence of body resistor and contact barrier; thus, there still exists a high potential difference between the electrode wire and the surrounding area of discharge points after the dielectric breakdown, and this potential difference can form a second discharge. The effects of multi-channel discharge on the processing efficiency of semiconductor EDM are also studied. The energy of each discharge channel is roughly equal, and thus the multi-channel discharge at the same time can increase the energy utilization ratio of the pulsed power supply and improve the processing efficiency. (C) 2014 Elsevier Ltd. All rights reserved.
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