期刊
IEEE TRANSACTIONS ON PLASMA SCIENCE
卷 41, 期 8, 页码 1979-1986出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TPS.2013.2256472
关键词
Cathode potential drop (CPD); cathode spot; Cr; Cu; transient spot; vacuum arc; W
资金
- Israel Science Foundation [912/11]
A transient model of spot on a bulk cathode is developed, considering the initial adjacent plasma generated during arc triggering. A self-consistent approach is described and a closed mathematical solution is presented to understand the transient cathode phenomena and the time-dependent cathode potential drop (CPD), considering the kinetics and gas dynamics of the cathode plasma flow. The time-dependent spot development is calculated by considering different existing lifetimes tau of an initial plasma adjacent to the cathode for Cu, Cr, and W and 10-A spot current. The lifetime t is in the range of 2-100 ns. The solution shows that for Cu, the cathode temperature increased from 3500 to 4300 K with spot time. The CPD decreased with spot time from initial values 100-45 V (depending on tau) to 14-15 V at steady state. The solution for a refractory W cathode is obtained using a previously developed virtual cathode model. Calculation shows that a spot current density of similar to 10(7) A/cm(2) can support the spot initiation in a time of 2 ns considering W cathode vaporization with plasma generation by atom ionization. When tau increased from 2 ns to the 2 mu s range, the W cathode temperature decreased from similar to 10 000 K to a relatively low level of 7500 K.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据