4.3 Article

A Plasma Lens for Magnetron Sputtering

期刊

IEEE TRANSACTIONS ON PLASMA SCIENCE
卷 39, 期 11, 页码 2528-2529

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TPS.2011.2157172

关键词

Plasma devices; plasma materials processing; plasma transport processes; sputtering; thin films

资金

  1. U.S. Department of Energy [DE-AC02-05CH11231]

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A plasma lens, consisting of a solenoid and potential-defining ring electrodes, has been placed between a magnetron and substrates to be coated. Photography reveals qualitative information on excitation, ionization, and the transport of plasma to the substrate.

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