4.3 Article

Comparing Deposition Properties in an Atmospheric Pressure Plasma System Operating in Uniform and Nonuniform Modes

期刊

IEEE TRANSACTIONS ON PLASMA SCIENCE
卷 37, 期 6, 页码 961-969

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TPS.2009.2015226

关键词

CVD; optical imaging; plasma properties; thin films

资金

  1. EPSRC [EP/D06337X/1] Funding Source: UKRI
  2. Engineering and Physical Sciences Research Council [EP/D06337X/1] Funding Source: researchfish

向作者/读者索取更多资源

A large-scale atmospheric pressure plasma has been generated in helium, and the time-resolved optical and electrical properties have been shown to produce a homogeneous dielectric barrier discharge. Introducing tetraethyl orthosilicate as a liquid aerosol into this plasma produced clear, uniform, and smooth plasma polymerized coatings. Optical imaging studies have shown that adding 1% oxygen to the gas mixture induced a switch from a homogeneous plasma to a filamentary or microdischarge mode of operation, and this has been shown to dramatically alter the morphology of the deposited coatings. Surface analysis reveals significant particulate inclusions in coatings deposited from the filamentary mode of operation.

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