4.4 Article

Ion-Implantation-Induced Disorder in FePt-C Thin Films

期刊

IEEE TRANSACTIONS ON MAGNETICS
卷 55, 期 3, 页码 -

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TMAG.2018.2867912

关键词

Ion implantation; magneto-crystalline anisotropy; self-assembly (SA); torque magnetometry

资金

  1. MOE AcRF [RG163/15]
  2. NRF-IIP [NRF2015-IIP003-001]

向作者/读者索取更多资源

The effects of ion implantation through a mask on the structural and magnetic properties of FePt-C films were investigated. The mask pattern was fabricated using self-assembly of di-block copolymers. For implantation, high- (40 keV for N-14(+) and 100 keV for Ar-40(+)) and low- (7.5 keV for N-14(+) and 4.5 keV for Ar-40(+)) energy N-14(+) and Ar-40(+) ions were used to modify the structural and magnetic properties of these films. The X-ray diffraction and transport of ions in matter simulations were performed for understanding the structural changes due to the ion implantations. These results revealed the conversion of face-centered tetragonal phase to face-centered cubic (FCC) phase for Ar-40(+) ion implantations and increase in inter-planar spacing of FCC FePt (111) planes for N-14(+) ion implantations. Magnetic properties were then probed by using a vibrating sample magnetometer (VSM), torque magnetometer, and magnetic force microscopy (MFM). The results from VSM and torque magnetometer showed a change in anisotropy from out-of-plane to in-plane directions for all the implantation cases except for low-energy Ar-40(+) ion implantations. The MFM images also showed an absence of stripe domains confirming the above-mentioned effects.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.4
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据