期刊
MATERIALS CHEMISTRY AND PHYSICS
卷 165, 期 -, 页码 125-133出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.matchemphys.2015.09.006
关键词
Thin films; Optical materials; Electrical conductivity; Semiconductors; Coatings
资金
- FAPESP [2011/17184-1, 2013/19420-0, 2015/06064-6]
- Capes PNPD
A simple and efficient method for deposition of reduced graphene oxide (RGO) thin firms onto arbitrary substrates is described. The present protocol consists in the application of radial compression to a thin layer of graphene oxide (GO) formed at the air liquid interface of an ammoniacal dispersion of graphene oxide by continuous irradiation with visible light, that drives both the formation and curing of the film. Both infrared and near infrared luminescence spectroscopies were used for the proposition of a chemical mechanism in which the in situ singlet oxygen Delta O-1(2), generated by the photosensitization of molecular oxygen to visible light, initiates the formation and curing of the film. The GO and RGO films display Raman spectral signatures typical of graphene - based materials, with thickness of ca. 20 nm as evaluated by atomic force microscopy. The deposited films exhibited good transparency to visible light (max. 85%; 550 +/- 2 nm), electrical resistivity equals to 14 +/- 0.02 0 Omega m, sheet resistance equals to 5 k Omega sq(-1) with associated charge carrier mobility of 200 cm(2)/V s. (C) 2015 Elsevier B.V. All rights reserved.
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