4.6 Article

On the Spreading Resistance of Thin-Film Contacts

期刊

IEEE TRANSACTIONS ON ELECTRON DEVICES
卷 59, 期 7, 页码 1936-1940

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2012.2195317

关键词

Constriction resistance; contact resistance; electrical contacts; skin depth; spreading resistance; thin films

资金

  1. Air Force Office of Scientific Research Grant on the Basic Physics of Distributed Plasma Discharges
  2. AFOSR [FA9550-09-1-0662]
  3. L-3 Communications Electron Device Division
  4. Northrop Grumman Corporation
  5. University of Michigan Institute for Plasma Science and Engineering

向作者/读者索取更多资源

The spreading resistance of a microscopic area of contact (the alpha-spot) located in a thin film is studied for both Cartesian and cylindrical geometries. The effect of film thickness h on the spreading resistance is evaluated over a large range of aspect ratios. In the limit h -> 0, the normalized thin-film spreading resistance (R) over bar (s) converges to the finite values, i.e., 2.77 for the Cartesian case and 0.28 for the cylindrical case. An interpretation of these limits is given. Extension to a general a-spot geometry is proposed.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据