4.6 Article

Performance of n-Type InSb and InAs Nanowire Field-Effect Transistors

期刊

IEEE TRANSACTIONS ON ELECTRON DEVICES
卷 55, 期 11, 页码 2939-2945

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2008.2005173

关键词

Bandstructure; effective mass; InAs nanowire field-effect transistors (NWFETs); InSb NWFETs; k.p method; NWs

资金

  1. Semiconductor Research Corporation Focus Center Research Program on Nano Materials (FENA)

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The electronic structure of highly scaled InSb and InAs nanowire (NW) field-effect transistors (FETs) is calculated with an eight-band k.p model. Cross sections of 4 nm or less result in bandgaps of 0.8 eV or more. For these cross sections, all devices are single moded and operate in the quantum capacitance limit. Analytical expressions for the transconductance, cutoff frequency, and gate delay time are presented and compared to numerical results. The dependence of the intrinsic cutoff frequency on drive current is weak, scaling as root ID with values in the 4-7 THz range that are good for RF applications. The gate delay times strongly depend on the drive current, scaling as I-D(-3/2) with values ranging from 25 to 132 fs which are competitive for digital applications.

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