期刊
MACROMOLECULES
卷 48, 期 11, 页码 3422-3430出版社
AMER CHEMICAL SOC
DOI: 10.1021/acs.macromol.5b00518
关键词
-
资金
- MRSEC Program of the NSF [DMR 1121053]
- NSF
We report herein the modular synthesis and nanolithographic potential of poly(dimethylsiloxane-block-methyl methacrylate) (PDMS-b-PMMA) with self-assembled domains approaching sub-10 nm periods. A straightforward and modular coupling strategy, optimized for low molecular weight diblocks and using copper-catalyzed azidealkyne click cycloaddition, was employed to obtain a library of PDMS-b-PMMA and poly(dimethylsiloxane-block-styrene) (PDMS-b-PS) diblock copolymers. FloryHuggins interaction parameters, determined from small-angle X-ray scattering experiments, were high for PDMS-b-PMMA (chi similar to 0.2 at 150 degrees C), suggesting this diblock copolymer system has promise for sub-10 nm lithographic applications when compared to the corresponding PDMS-b-PS diblock copolymers (chi similar to 0.1 at 150 degrees C). Performance evaluation in thin film self-assembly experiments allowed domain periods as small as 12.1 nm to be obtained, which is among the smallest highly ordered nanoscale patterns reported hitherto for thermally annealed materials.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据