期刊
IEEE PHOTONICS TECHNOLOGY LETTERS
卷 22, 期 15, 页码 1147-1149出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LPT.2010.2051145
关键词
Fabrication; optical waveguides; plasma materials-processing applications
资金
- NIH/NIBIB [R01-EB006097]
- NSF [ECS-0528714, ECS-0528730]
- W. M. Keck Center for Nanoscale Optofluidics at UCSC
Micrometer-sized hollow antiresonant reflecting optical waveguides on silicon substrates have been previously demonstrated with liquid and gas-filled cores. Previous designs have nonideal geometries, with nonuniform lateral layers around the hollow core, resulting in higher loss than could potentially be achieved. A new design and fabrication process has been developed involving hollow waveguide fabrication on a self-aligned pedestal (SAP) using anisotropic plasma etching. With the SAP structure, the hollow core is surrounded by uniform layers and a terminal layer of air on three sides, resulting in air-core waveguide loss of 1.54 cm(-1) at 785 nm and high fabrication yield.
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