4.5 Article

Photonic Device Layout Within the Foundry CMOS Design Environment

期刊

IEEE PHOTONICS TECHNOLOGY LETTERS
卷 22, 期 8, 页码 544-546

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LPT.2010.2041445

关键词

Complementary metal-oxide-semiconductor (CMOS) integrated circuits; design automation; optical device fabrication; optical planar waveguide components

资金

  1. Defense Advanced Research Project Agency
  2. National Science Foundation

向作者/读者索取更多资源

A design methodology to layout photonic devices within standard electronic complementary metal-oxide-semiconductor (CMOS) foundry data preparation flows is described. This platform has enabled the fabrication of designs in three foundry scaled-CMOS processes from two semiconductor manufacturers.

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