期刊
IEEE ELECTRON DEVICE LETTERS
卷 34, 期 10, 页码 1340-1342出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2013.2276038
关键词
CVD graphene; f(MAX); graphene; multiple fingers; mushroom gate; radio frequency (RF); T-shaped gate; transistors
Gate resistance plays a key role in determining the maximum oscillation frequency (f(MAX)) of all radio frequency transistors. This letter presents a new graphene device structure having multiple-finger T-shaped gates embedded in the substrate. The structure possesses several advantages over conventional top gate structures, including low gate resistance, low parasitic capacitance, scalable gate dielectric, and simple interconnect wiring. With 1 V drain bias, f(MAX) up to 20 GHz, and similar to 25%-43% higher than the current gain cutoff frequency (f(T)), is achieved from devices with a channel length down to 250 nm.
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