期刊
IEEE ELECTRON DEVICE LETTERS
卷 33, 期 7, 页码 928-930出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2012.2195290
关键词
pMOSFET; random telegraph noise (RTN); tip-shaped SiGe source/drain (S/D)
资金
- National Science Council of Taiwan [NSC 100-2221-E-230-007]
- Center for Frontier Materials and Micro/Nano Science and Technology, National Cheng Kung University (NCKU)
- Advanced Optoelectronic Technology Center, NCKU under Ministry of Education
- LED Lighting Research Center of NCKU
- [101-D0204-6]
The random telegraph noise (RTN) characteristics of 28-nm pMOSFETs with tip-shaped SiGe source/drain have been investigated. RTN analysis found that strained devices undergo higher compressive strain; the trap position from the Si/SiO2 interface is reduced, because of the closer trap energy level near the valence band. Although tip-shaped SiGe process induces higher oxide trap density, the trap position corresponding to the tunneling attenuation length (lambda) may result in lower 1/f noise level in tip-shaped SiGe S/D devices as compared with that of control devices.
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