4.6 Article

Size-Dependent Retention Time in NiO-Based Resistive-Switching Memories

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IEEE ELECTRON DEVICE LETTERS
卷 31, 期 4, 页码 353-355

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IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2010.2040799

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Nonvolatile memory; reliability estimation; reliability modeling; resistive-switching memory (RRAM)

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NiO-based resistive-switching memory (RRAM) is a promising new technology for high-density nonvolatile storage. The main obstacles to practical application are the large and hardly scalable reset (programming) current and the reliability at high temperature. This letter studies temperature-accelerated data retention in RRAM cells from both experimental and theoretical standpoints, addressing the size/nature of the conductive filament and clarifying the tradeoff between data retention and reset current.

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