4.6 Article

Investigation of State Stability of Low-Resistance State in Resistive Memory

期刊

IEEE ELECTRON DEVICE LETTERS
卷 31, 期 5, 页码 485-487

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2010.2042677

关键词

Resistance random access memory (ReRAM); resistive memory; retention

资金

  1. National Research Program of the 0.1-Terabit Nonvolatile Memory Development Project
  2. Korea Science and Engineering Foundation
  3. Ministry of Education, Science and Technology of Korea
  4. Hynix
  5. Korea Institute of Industrial Technology(KITECH) [10029943] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
  6. National Research Foundation of Korea [2008-0060067] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

向作者/读者索取更多资源

We investigated the state stability of the low-resistance state (LRS) in a resistive switching memory having a Pt/Cu : MoOx/GdOx/Pt structure. Various resistance values of LRS were accurately controlled using an external load resistor connected in series with the resistive memory device. We found that the retention time decreased with an increase in the resistance of LRS. We performed accelerating tests for resistance transition from a low- to a high-resistance state under temperatures ranging from 200 degrees C to 250 degrees C. A predicted resistance of LRS for a ten-year retention period at 85 degrees C was determined based on the Arrhenius law.

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