期刊
IEEE ELECTRON DEVICE LETTERS
卷 29, 期 9, 页码 1043-1046出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2008.2001234
关键词
Al2O3; electron trap; energy distribution; Flash memory; floating gate; high-k dielectrics; interpoly dielectric (IPD) layer; pulsed C-V
资金
- EPSRC [EP/C508793/2]
- HEFCE PRF
- Engineering and Physical Sciences Research Council [EP/C508793/1] Funding Source: researchfish
SiO2/high-k, dielectric stack is a candidate for replacing the conventional SiO2-based dielectric stacks for future Flash memory cells. Electron traps in the high-k layer can limit the memory retention via the trap-assisted tunneling, and there is a pressing need for their characterization. A new two-pulse C-V measurement technique is developed in this letter, which, for the first time, allows us to probe the discharge of electron traps throughout the SiO2/high-k stack. It complements the charge pumping technique, which can only probe near-interface traps. It is demonstrated that a large number of electron traps, indeed, exist in the bulk of high-k layer. Bulk electron traps also have different discharge characteristics from those near the SiO2/high-k interface.
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