期刊
IEEE ELECTRON DEVICE LETTERS
卷 29, 期 12, 页码 1360-1363出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2008.2006288
关键词
Hf silicates; high-kappa gate dielectric; instability; negative bias temperature instability (NBTI); positive charges; reliability; spatial distribution
资金
- Engineering and Physical Science Research Council of U.K. [EP/C003071/1]
- Engineering and Physical Sciences Research Council [EP/C003071/1] Funding Source: researchfish
Positive charges in Hf-based gate stacks play an important role in the negative bias temperature instability of pMOSFETs, and their suppression is a pressing issue. The location of positive charges is not clear, and central to this letter is determining which layer of the stack dominates positive charging. The results clearly show that positive charges are dominated by the interfacial layer (IL) and that they do not pile up at the HfsiON/IL interface. The results support the assumption that positive charges are located close to the IL/substrate interface. Unlike electron trapping that reduces rapidly for thinner Hf dielectric layer, positive charges cannot be reduced by using a thinner HfSiON film.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据