期刊
HIGH PRESSURE RESEARCH
卷 33, 期 3, 页码 633-641出版社
TAYLOR & FRANCIS LTD
DOI: 10.1080/08957959.2013.813943
关键词
high pressure; tantalum nitride; tantalum oxynitride; X-ray diffraction; laser-heated diamond anvil cell; phase stability
资金
- DFG, Germany [SPP1236, FR-2491/2-1, WI-1232/26-1]
- BMBF, Germany [05KS7RF1, 05K10RFA]
- HASYLAB, DESY, Germany
- Office of Science, Office of Basic Energy Science, of the US Department of Energy [DE-AC02-05CH11231]
- COMPRES under NSF [EAR 06-49658]
The high pressure high-temperature stability of tantalum mononitrides was investigated at 8-23.5GPa and 1400-3500K by in situ powder synchrotron X-ray diffraction using the laser-heated diamond anvil cell and E-TaN as starting material. The transformation from E-TaN to ?-TaN was observed and ?-TaN was confirmed as the stable high-(p, T) tantalum mononitride. At temperatures above 3000K at 16-23.5GPa, the formation of a novel quenchable high pressure high-temperature phase was observed. Under nitrogen excess E-TaN reacted with nitrogen to the high-(p, T) phase -Ta2N3 as the main stable phase at 8-13GPa and about 2000K. This behaviour is similar to the reaction of pure Ta with nitrogen at high-(p, T) conditions. In addition, we have determined the bulk moduli of ?-TaN (B=360(15)GPa), which is less compressible than E-TaN and -Ta2N3, and of TaON (B=267(8)GPa).
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