友情提示：以下期刊信息可能会有更新，仅供参考，请在投稿前自行登录期刊官网仔细核实。
期刊名
Journal of Micro-Nanolithography MEMS and MOEMS
J MICRO-NANOLITH MEM
ISSN / eISSN
1932-5150 / 1932-5134
目标和范围
The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes peer-reviewed papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, microelectromechanical systems, micro-optoelectromechanical systems, and photonics industries.
研究方向
工程：电子与电气
材料科学：综合
纳米科技
CiteScore
3.40
查看趋势图
CiteScore 学科排名
| 类别 | 分区 | 排名 |
|---|---|---|
| Engineering - Mechanical Engineering | Q2 | #299/672 |
| Engineering - Electrical and Electronic Engineering | Q2 | #389/797 |
| Engineering - Atomic and Molecular Physics, and Optics | Q3 | #113/224 |
| Engineering - Condensed Matter Physics | Q3 | #223/434 |
| Engineering - Electronic, Optical and Magnetic Materials | Q3 | #155/284 |
Web of Science 核心收藏夹
| Science Citation Index Expanded (SCIE) | Social Sciences Citation Index (SSCI) |
|---|---|
| - | - |
H-index
37
出版国家或地区
UNITED STATES
出版商
SPIE
出版周期
Quarterly
出版年份
2007
Open Access
NO
通讯方式
SPIE-SOC PHOTOPTICAL INSTRUMENTATION ENGINEERS, 1000 20TH ST, PO BOX 10, BELLINGHAM, USA, WA, 98225
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